Granularity in ion-beam-sputtered TiO2 films

被引:19
作者
Albertinetti, N
Minden, HT
机构
[1] Electronics Systems Division-N, Northrop Corporation, Norwood, MA, 02062
[2] Concord, MA, 01742-4011
来源
APPLIED OPTICS | 1996年 / 35卷 / 28期
关键词
thin films; defect structures; optical coatings;
D O I
10.1364/AO.35.005620
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
TiO2-SiO2 multilayer dielectric stacks that were deposited by ion-beam sputtering were found to have a granular structure. The grains were in the TiO2 layers rather than in the SiO2 layers. Their formation was due to the heating of the film during deposition. When the apparatus was modified to reduce the substrate temperature, the granularity was eliminated. (C) 1996 Optical Society of America
引用
收藏
页码:5620 / 5625
页数:6
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