Positron annihilation as a method to characterize porous materials

被引:299
作者
Gidley, David W. [1 ]
Peng, Hua-Gen [1 ]
Vallery, Richard S. [1 ]
机构
[1] Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA
关键词
porous films; pore size; low dielectric constant; positronium;
D O I
10.1146/annurev.matsci.36.111904.135144
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Beam-based positron annihilation spectroscopy (PAS) is a powerful porosimetry technique with broad applicability in the characterization of nanoporous thin films, especially insulators. Pore sizes and distributions in the 0.3-30 nm range are nondestructively determined with only the implantation of low-energy positrons from a table-top beam. Depth-profiling with PAS has proven to be an ideal way to measure the interconnection length of pores, search for depth-dependent inhomogeneities or damage in the pore structure, and explore porosity hidden beneath dense layers or diffusion barriers. The capability of PAS is rapidly maturing as new intense positron beams around the globe spawn more accessible PAS facilities. After a short primer on the physics of positrons in insulators, the various probe techniques of PAS are briefly summarized, followed by a more detailed discussion of the wide range of nanoporous film parameters that PAS can characterize.
引用
收藏
页码:49 / 79
页数:31
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