Chemical vapor deposition of electrolyte thin films based on yttria-stabilized zirconia

被引：21

作者：

Gelfond, N. V. ^{[1
]}

Bobrenok, O. F. ^{[2
]}

Predtechensky, M. R. ^{[2
]}

Morozova, N. B. ^{[1
]}

Zherikova, K. V. ^{[1
]}

Igumenov, I. K. ^{[1
]}

机构：

[1] Russian Acad Sci, Nikolaev Inst Inorgan Chem, Siberian Branch, Novosibirsk 630090, Russia

[2] Russian Acad Sci, Kutateladze Inst Thermophys, Siberian Branch, Novosibirsk 630090, Russia

来源：

INORGANIC MATERIALS | 2009年 / 45卷 / 06期

关键词：

COMPLEXES;

D O I：

10.1134/S0020168509060144

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Gas-tight electrolyte films are obtained by chemical vapor deposition for solid oxide fuel cells from yttria-stabilized zirconia (YSZ) with a thickness of 4-15 mu m on supporting porous ceramic anodes (YSZ/NiO). Volatile metal complexes with dipivaloylmethane Zr(dpm)(4) and Y(dpm)(3) are used as precursors. On the basis of an analysis of thermal properties of the starting compounds, parameter ranges in deposition processes are determined. Dependences of the structure, composition, and electrical characteristics on deposition conditions are found for YSZ electrolyte films. Electrochemical solid oxide fuel cells that operate at low temperatures with an open circuit voltage of 0.98-1.08 V and specific power up to 440 mW/cm(2) at 1073 K and 1200 mW/cm(2) at 1173 K are constructed.

引用

页码：659 / 665

页数：7

共 21 条

[1] Macro- and micro-scale simulation of growth rate and composition in MOCVD of yttria-stabilized zirconia [J].

Akiyama, Y ;

Imaishi, N ;

Shin, YS ;

Jung, SC .

JOURNAL OF CRYSTAL GROWTH, 2002, 241 (03) :352-362

[2] VAPOR-PRESSURES OF SEVERAL METAL-2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONE COMPLEXES MEASURED BY A KNUDSEN EFFUSION METHOD [J].

BRUNNER, HR ;

CURTIS, BJ .

JOURNAL OF THERMAL ANALYSIS, 1973, 5 (01) :111-115

[3] MASS-SPECTROMETRIC STUDY OF GAS-PHASE THERMAL-STABILITY OF YTTRIUM(III) TRIS(DIPIVALOYLMETHANATE) [J].

BYKOV, AF ;

SEMYANNIKOV, PP ;

IGUMENOV, IK .

JOURNAL OF THERMAL ANALYSIS, 1992, 38 (06) :1477-1486

[4] RESEARCH ON YSZ THIN-FILMS PREPARED BY PLASMA-CVD PROCESS [J].

CAO, CB ;

WANG, JT ;

YU, WJ ;

PENG, DK ;

MENG, GY .

THIN SOLID FILMS, 1994, 249 (02) :163-167

[5] The current status of fuel cell technology for mobile and stationary applications [J].

de Bruijn, F .

GREEN CHEMISTRY, 2005, 7 (03) :132-150

[6] Solid single-source metal organic chemical vapor deposition of yttria-stabilized zirconia [J].

Dubourdieu, C ;

Kang, SB ;

Li, YQ ;

Kulesha, G ;

Gallois, B .

THIN SOLID FILMS, 1999, 339 (1-2) :165-173

[7] Structural and optical properties of yttria-stabilized-zirconia films grown by MOCVD [J].

Garcia, G ;

Figueras, A ;

Merino, RI ;

Orera, VM ;

Llibre, J .

THIN SOLID FILMS, 2000, 370 (1-2) :173-178

[8]

GELFOND NV, 2005, P 20 INT C COORD BIO, V7, P52

[9]

Igumenov I.K., 2001, J PHYS 4, V11, p3

[10]

LIN YS, 1992, KEY ENG MATER, V61, P465

← 1 2 3 →