Critical factor for epitaxial growth of cobalt-doped BaFe2As2 films by pulsed laser deposition

被引:16
|
作者
Hiramatsu, Hidenori [1 ,2 ]
Sato, Hikaru [1 ]
Katase, Takayoshi [3 ]
Kamiya, Toshio [1 ,2 ]
Hosono, Hideo [1 ,2 ,3 ]
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Tokyo Inst Technol, Mat Res Ctr Element Strategy, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[3] Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
基金
日本学术振兴会;
关键词
GRAIN-BOUNDARIES; SUPERCONDUCTIVITY;
D O I
10.1063/1.4874609
中图分类号
O59 [应用物理学];
学科分类号
摘要
We heteroepitaxially grew cobalt-doped BaFe2As2 films on (La, Sr)(Al, Ta)O-3 single-crystal substrates by pulsed laser deposition using four different wavelengths and investigated how the excitation wavelength and pulse energy affected growth. Using the tilting and twisting angles of X-ray diffraction rocking curves, we quantitatively analyzed the crystallinity of each film. We found that the optimal deposition rate, which could be tuned by pulse energy, was independent of laser wavelength. The high-quality film grown at the optimal pulse energy (i.e., the optimum deposition rate) exhibited high critical current density over 1 MA/cm(2) irrespective of the laser wavelength. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:5
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