A SIMULATION-BASED FRAMEWORK FOR INDUSTRIAL AUTOMATED WET-ETCH STATION SCHEDULING PROBLEMS IN THE SEMICONDUCTOR INDUSTRY

被引:0
作者
Aguirre, Adrian M. [1 ]
Cafaro, Vanina G. [1 ]
Mendez, Carlos A. [1 ]
Castro, Pedro M. [2 ]
机构
[1] Univ Nacl Litoral, CONICET, INTEC, RA-3000 Santa Fe, Argentina
[2] UMOSE, Lab Nacl Energia & Geol, P-1649038 Lisbon, Portugal
来源
23RD EUROPEAN MODELING & SIMULATION SYMPOSIUM, EMSS 2011 | 2011年
关键词
Discrete-event simulation; Semiconductor Manufacturing System (SMS); Automated Wet-Etch Station (AWS); Arena Software;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work presents the development and application of an advanced modelling, simulation and optimization-based framework to the efficient operation of the Automated Wet-etch Station (AWS), a critical stage in Semiconductor Manufacturing Systems (SMS). Lying on the main concepts of the process-interaction approach, principal components and tools available in the Arena simulation software were used to achieve the best representation of this complex and highly-constrained manufacturing system. Furthermore, advanced Arena templates were utilized for modelling very specific operation features arising in the process under study. The major aim of this work is to provide a novel computer-aided tool to systematically improve the dynamic operation of this critical manufacturing station by quickly generating efficient schedules for the shared processing and transportation devices.
引用
收藏
页码:384 / 393
页数:10
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