Extension of surface-wave-excited high-density plasma column sustained along graphite rod target

被引:11
作者
Kousaka, Hiroyuki [1 ]
Umehara, Noritsugu [1 ]
机构
[1] Nagoya Univ, Grad Sch Engn, Dept Mech Sci & Engn, Chikusa Ku, Nagoya, Aichi 4640814, Japan
关键词
microwave plasma; surface wave; high-density plasma; sputtering; plasma source;
D O I
10.1016/j.vacuum.2005.11.015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In typical, surface-wave-excited plasma (SWP) is generated along dielectric antennas such as a quartz tube or an alumina disk to guide surface waves. However, recently, we introduced a new SWP sustained along the surface of a metal antenna at a negative voltage against a grounded chamber. In this work, Ar plasma was generated along a graphite rod (10 mm in diameter and 190 mm in length) at a background gas pressure of 5.7Pa with an incident microwave power of 200W and a negative voltage V, supplied to the rod. At V-t = 0 V, overdense SWP was sustained locally at around the one end of the graphite rod. The plasma was then confirmed to extend llonger along the rod axis, with increasing V-t. At V-t = - 200 V, the plasma showed a columnar structure with an electron density larger than 10(11) cm(-3). Note that the SWP column obtained strongly sputtered the graphite rod; thus, we considered that a new sputtering source can be developed employing this new technique, or SWPs sustained along metal targets. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:806 / 809
页数:4
相关论文
共 10 条
[1]  
[Anonymous], 2000, GUIDED WAVE PRODUCED
[2]   Fine structure of the electromagnetic fields formed by backward surface waves in an azimuthally symmetric surface wave-excited plasma source [J].
Kousaka, H ;
Ono, K .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (02) :273-286
[3]   Numerical analysis of the electromagnetic fields in a microwave plasma source excited by azimuthally symmetric surface waves [J].
Kousaka, H ;
Ono, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (4A) :2199-2206
[4]  
KOUSAKA H, 2005, P 8 INT S SPUTT PLAS, V1, P455
[5]  
KOUSAKA H, 2005, P 51 SPRING M JAP SO, V1, P164
[6]  
Lieberman M. A., 1994, Principles of Plasma Discharges and Materials Processing, V1st ed.
[7]   Comparative study of (Ba,Sr)TiO3 films prepared by electron cyclotron resonance plasma sputtering and metal-organic decomposition [J].
Matsumoto, T ;
Niino, A ;
Numata, K ;
Saito, H ;
Miyake, S .
THIN SOLID FILMS, 2005, 476 (01) :73-78
[8]  
POZAR DM, 2005, MICROWAVE ENG, P127
[9]   New-type microwave plasma source excited by azimuthally symmetric surface waves with magnetic multicusp fields [J].
Tuda, M ;
Ono, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (05) :2832-2839
[10]   Large-diameter microwave plasma source excited by azimuthally symmetric surface waves [J].
Tuda, M ;
Ono, K ;
Ootera, H ;
Tsuchihashi, M ;
Hanazaki, M ;
Komemura, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03) :840-848