Exploiting the β-effect:: Thin film deposition of silicon dioxide and silicon nitride.

被引：0

作者：

Arkles, B

Berry, DH

Kaloyeros, AE

机构：

[1] Univ Penn, Dept Chem, Philadelphia, PA 19104 USA

[2] New York Stae ctr Adv Thin Film Technol, New York, NY USA

[3] SUNY Albany, Dept Phys, Albany, NY 12222 USA

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2002年 / 223卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

237-INOR

引用

页码：A41 / A42

页数：2

共 50 条

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