Near atomically smooth alkali antimonide photocathode thin films

被引：54

作者：

Feng, Jun ^{[1
]}

Karkare, Siddharth ^{[1
]}

Nasiatka, James ^{[1
]}

Schubert, Susanne ^{[1
]}

Smedley, John ^{[2
]}

Padmore, Howard ^{[1
]}

机构：

[1] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

[2] Brookhaven Natl Lab, Upton, NY 11973 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2017年 / 121卷 / 04期

关键词：

ENERGY;

D O I：

10.1063/1.4974363

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nano-roughness is one of the major factors degrading the emittance of electron beams that can be generated by high efficiency photocathodes, such as the thermally reacted alkali antimonide thin films. In this paper, we demonstrate a co-deposition based method for producing alkali antimonide cathodes that produce near atomic smoothness with high reproducibility. We calculate the effect of the surface roughness on the emittance and show that such smooth cathode surfaces are essential for operation of alkali antimonide cathodes in high field, low emittance radio frequency electron guns and to obtain ultracold electrons for ultrafast electron diffraction applications. Published by AIP Publishing.

引用

页数：5

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