Deposition of osmium and ruthenium thin films from organometallic cluster precursors

被引：6

作者：

Li, Chunxiang ^{[1
]}

Leong, Weng Kee ^{[1
]}

Loh, Kian Ping ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore

来源：

APPLIED ORGANOMETALLIC CHEMISTRY | 2009年 / 23卷 / 05期

关键词：

osmium; ruthenium; alloy; cluster; CVD; CHEMICAL-VAPOR-DEPOSITION; CVD SOURCE REAGENTS; DC-GLOW-DISCHARGE; METAL-CARBONYLS; COMPLEXES;

D O I：

10.1002/aoc.1494

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Single-source organometallic precursors based on a number of homometallic clusters as well as heterometallic cluster RuOs3(CO)(13)(mu-H)(2) have been used for the chemical vapor deposition of osmium films and osmium-ruthenium alloy films, respectively. Copyright (C) 2009 John Wiley & Sons, Ltd.

引用

页码：196 / 199

页数：4

共 16 条

[1] RU AND OS FILM DEPOSITION FROM METAL-CARBONYLS [J].

BERRY, AD ;

BROWN, DJ ;

KAPLAN, R ;

CUKAUSKAS, EJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02) :215-218

[2] Chemical vapor deposition of metallic thin films using homonuclear and heteronuclear metal carbonyls [J].

Boyd, EP ;

Ketchum, DR ;

Deng, HB ;

Shore, SG .

CHEMISTRY OF MATERIALS, 1997, 9 (05) :1154-1158

[3] Deposition of osmium thin films using pyrazolate complexes as CVD source reagents [J].

Chi, Y ;

Yu, HL ;

Ching, WL ;

Liu, CS ;

Chen, YL ;

Chou, TY ;

Peng, SM ;

Lee, GH .

JOURNAL OF MATERIALS CHEMISTRY, 2002, 12 (05) :1363-1369

[4]

HAYAKAWA Y, 1990, THIN SOLID FILMS, V347, P56

[5]

Hitchman M.L., 1993, Chemical Vapor Deposition

[6] Properties and application feasibility of an osmium-oxygen thin film prepared by DC-glow-discharge deposition from osmium tetraoxide [J].

Inoue, H ;

Satoh, K .

BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1999, 72 (01) :121-126

[7]

Kern Werner., 1993, HDB SEMICONDUCTOR WA

[8] The heteronuclear cluster RuOs3(μ-H)2(CO)13 -: a high yield synthesis, isomerism and a triphenylphosphine derivative [J].

Pereira, L ;

Leong, WK ;

Wong, SY .

JOURNAL OF ORGANOMETALLIC CHEMISTRY, 2000, 609 (1-2) :104-109

[9] Physical properties of osmium doped tin oxide thin films [J].

Rella, R ;

Siciliano, P ;

Vasanelli, L ;

Gerardi, C ;

Licciulli, A .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (04) :2369-2371

[10]

Rosenberg S., 1989, INORG SYNTH, V25, P187

← 1 2 →