Patterned Au/Poly(dimethylsiloxane) Substrate Fabricated by Chemical Plating Coupled with Electrochemical Etching for Cell Patterning

In this paper, we present a novel approach for preparing patterned Au/poly(dimethylsiloxane) (PDMS) substrate. Chemical gold plating instead of conventional metal evaporation or sputtering was introduced to achieve a homogeneous gold layer on native PDMS for the first time. which possesses low-cost and simple operation. An electrochemical oxidation reaction accompanied by the coordination of gold and chloride anion was then exploited to etch gold across the region covered by electrolyte. On the basis of such an electrochemical etching, heterogeneous Au/PDMS substrate which has a gold "island" pattern or PDMS dots pattern was fabricated. Hydrogen bubbles Which were generated in the etching process due to water electrolysis were used to produce a safe region under the Pt auxiliary electrode. The safe region would protect gold film from etching and lead to the formation of the gold "island" pattern. In virtue of a PDMS stencil with holes array, gold could be etched from the exposed region and take on the PDMS dots pattern which was selected to for protein and cell patterning. This patterned Au/PDMS substrate is very convenient to construct cytophobic and cytophilic regions. Self-assembled Surface modification of (1-mercaptoundec-11-yl)hexa-(ethylene glycol) oil gold and adsorption of fibronectin on PDMS are suitable for effective protein and cell patterning. This patterned Au/PDMS substrate would be a potentially versatile platform for fabricating biosensing arrays.