Response of Si and InSb to ultrafast laser pulses

被引:34
作者
Dumitrica, T
Burzo, A
Dou, Y
Allen, RE [1 ]
机构
[1] Texas A&M Univ, Dept Phys, College Stn, TX 77843 USA
[2] Texas A&M Univ, Inst Quantum Studies, College Stn, TX 77843 USA
[3] Rice Univ, Dept Mech Engn & Mat Sci, Houston, TX 77251 USA
[4] Rice Univ, Ctr Nanoscale Sci & Technol, Houston, TX 77251 USA
[5] Princeton Univ, Dept Chem, Princeton, NJ 08544 USA
[6] Princeton Univ, Ctr Ultrafast Laser Applicat, Princeton, NJ 08544 USA
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2004年 / 241卷 / 10期
关键词
D O I
10.1002/pssb.200404934
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We present simulations of the response of Si and InSb to femtosecond-scale laser pulses of various intensities. In agreement with the experiments by various groups on various materials, there is a non-thermal phase transition for each of these semiconductors above a threshold intensity. Our simulations employ semiclassical electron-radiation-ion dynamics (SERID), a technique which is briefly described in the text. We also introduce a new addition to the technique, which provides a simple treatment of the correction due to motion of the atomic-orbital basis functions. We find that this correction is small in the present context, but it may be substantial in situations with more rapid atomic motion. Our expression for this correction is remarkably simple to employ because it amounts to nothing more than a generalized Peierls substitution. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2331 / 2342
页数:12
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