Electromigration in SnPb and Pb-free solder bumps

被引:7
作者
Rinne, GA [1 ]
机构
[1] Unit Elect Inc, Res Triangle Pk, NC 27709 USA
来源
54TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE, VOLS 1 AND 2, PROCEEDINGS | 2004年
关键词
D O I
10.1109/ECTC.2004.1319457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electromigration is the movement of metal atoms in the direction of current flow. It is caused by the transfer of momentum from the passing electrons to atoms in the lattice. First discovered in thin-film aluminum conductors some thirty years ago, electromigration is a significant concern for solder bumps on chip scale packages (CSP). As the understanding of solder electromigration expands, new opportunities for risk mitigation have emerged. This paper addresses the physics of electromigration in solders with particular emphasis on the time and temperature dependant factors that affect accelerated testing. Pb-based solders are contrasted with Pb-free solders by realizing that the microstructures of these solders are substantially different and the risks from electromigration are different as well. Results of recent experiments on the clectromigration of Pb-free solder bumps are reviewed and theories explaining the results are presented in this update on prior work.
引用
收藏
页码:974 / 978
页数:5
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