Chemistry of chlorine incorporation into silica glass

被引:0
作者
Kirchhof, J [1 ]
Unger, S [1 ]
Knappe, B [1 ]
Pissler, HJ [1 ]
Ruppert, K [1 ]
Köppler, R [1 ]
机构
[1] Inst Phys Hochtechnol E V, D-07702 Jena, Germany
来源
PROCEEDINGS OF THE 6TH INTERNATIONAL OTTO SCHOTT COLLOQUIUM | 1998年
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中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:393 / 396
页数:4
相关论文
共 4 条
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    RAU, H
    UNGELENK, J
    [J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1985, 89 (04): : 423 - 426
  • [2] DIFFUSION BEHAVIOR OF FLUORINE IN SILICA GLASS
    KIRCHHOF, J
    UNGER, S
    KLEIN, KF
    KNAPPE, B
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 181 (03) : 266 - 273
  • [3] ABOUT THE FLUORINE CHEMISTRY IN MCVD - THE MECHANISM OF FLUORINE INCORPORATION INTO SIO2 LAYERS
    KIRCHHOF, J
    UNGER, S
    KNAPPE, B
    KLEINERT, P
    FUNKE, A
    [J]. CRYSTAL RESEARCH AND TECHNOLOGY, 1987, 22 (04) : 495 - 501
  • [4] WALKER KL, 1983, OPT FIB COMM C