Light enhancement of Al nanoclusters embedded in Al-doped ZnO films of GaN-based light-emitting diodes

被引:6
作者
Lee, Ching-Ting [2 ,3 ]
Chou, Ying-Hung [2 ,3 ]
Yan, Jheng-Tai [2 ,3 ]
Lee, Hsin-Ying [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Electroopt Engn, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Adv Optoelect Technol Ctr, Tainan 701, Taiwan
[3] Natl Cheng Kung Univ, Ctr Micronano Sci & Technol, Tainan 701, Taiwan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 04期
关键词
aluminium; gallium compounds; II-VI semiconductors; light emitting diodes; metal clusters; nanostructured materials; semiconductor thin films; sputter deposition; transmission electron microscopy; wide band gap semiconductors; zinc compounds; N-TYPE GAN; OHMIC CONTACTS; LAYER; OUTPUT; IMPROVEMENT; POWER;
D O I
10.1116/1.3167370
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The aluminum (Al)-doped ZnO (AZO) films embedded with Al nanoclusters were employed to enhance the light output power of III-nitride-based light-emitting diodes (LEDs). The ZnO and Al targets were sputtered using a magnetron cosputtering system. Al nanoclusters embedded in AZO films were found in the AZO films deposited with Al dc power of 10 W and ZnO rf power of 100 W using high resolution transmission electron microscopy. An increase of 20% in the light output power of the GaN-based LEDs with AZO films embedded with Al nanoclusters can be obtained compared to the conventional LEDs operated at 500 mA.
引用
收藏
页码:1901 / 1903
页数:3
相关论文
共 18 条
  • [1] Electrical effects of plasma damage in p-GaN
    Cao, XA
    Pearton, SJ
    Zhang, AP
    Dang, GT
    Ren, F
    Shul, RJ
    Zhang, L
    Hickman, R
    Van Hove, JM
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (17) : 2569 - 2571
  • [2] AlGaN/GaN metal-oxide-semiconductor high-electron mobility transistors using oxide insulator grown by photoelectrochemical oxidation method
    Huang, Li-Hsien
    Yeh, Shu-Hao
    Lee, Ching-Ting
    Tang, Haipeng
    Bardwell, Jennifer
    Webb, James B.
    [J]. IEEE ELECTRON DEVICE LETTERS, 2008, 29 (04) : 284 - 286
  • [3] Improvement in light-output efficiency of InGaN/GaN multiple-quantum well light-emitting diodes by current blocking layer
    Huh, C
    Lee, JM
    Kim, DJ
    Park, SJ
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 92 (05) : 2248 - 2250
  • [4] Improvement of GaN-based light-emitting diode by indium-tin-oxide transparent electrode and vertical electrode
    Kim, SJ
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (08) : 1617 - 1619
  • [5] Investigation of optical and electrical properties of ZnO thin films
    Lai, Li-Wen
    Lee, Ching-Ting
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 2008, 110 (2-3) : 393 - 396
  • [6] White light emission of monolithic carbon-implanted InGaN-GaN light-emitting diodes
    Lee, Ching-Ting
    Yang, Ue-Zhi
    Lee, Chi-Sen
    Chen, Pou-Sung
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2006, 18 (17-20) : 2029 - 2031
  • [7] Long-term thermal stability of Ti/Al/Pt/Au Ohmic contacts to n-type GaN
    Lee, CT
    Kao, HW
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (17) : 2364 - 2366
  • [8] Nonalloyed ohmic mechanism of TiN interfacial layer in Ti/Al contacts to (NH4)2Sx-treated n-type GaN layers
    Lee, CT
    Lin, YJ
    Lin, CH
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 92 (07) : 3825 - 3829
  • [9] Current spreading of III-nitride light-emitting diodes using plasma treatment
    Lee, Hsin-Ying
    Pan, Ke-Hao
    Lin, Chih-Chien
    Chang, Yun-Chorng
    Kao, Fu-Jen
    Lee, Ching-Ting
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (04): : 1280 - 1283
  • [10] Optical and electrical properties of heavily Mg-doped GaN upon (NH4)2Sx treatment -: art. no. 202107
    Lin, YJ
    Chu, YL
    Huang, YS
    Chang, HC
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (20) : 1 - 3