Colossal permittivity properties of Zn,Nb co-doped TiO2 with different phase structures

被引:105
作者
Wei, Xianhua [1 ,2 ]
Jie, Wenjing [1 ]
Yang, Zhibin [1 ]
Zheng, Fengang [3 ]
Zeng, Huizhong [4 ]
Liu, Yun [5 ]
Hao, Jianhua [1 ]
机构
[1] Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
[2] Southwest Univ Sci & Technol, State Key Lab Cultivat Base Nonmet Composites & F, Mianyang 621010, Peoples R China
[3] Soochow Univ, Dept Phys, Jiangsu Key Lab Thin Films, Suzhou 215006, Peoples R China
[4] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
[5] Australian Natl Univ, Res Sch Chem, Canberra, ACT 2601, Australia
关键词
HIGH-DIELECTRIC-CONSTANT; PULSED-LASER DEPOSITION; THIN-FILMS; CERAMICS; TRANSITION; CAPACITORS; PLUS;
D O I
10.1039/c5tc02578h
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Colossal permittivity properties were studied in Zn,Nb co-doped TiO2 with different phase structures. The (Zn1/3Nb2/3)(0.05) Ti0.95O2 rutile ceramics were prepared by the solid state sintering technique, while the amorphous and anatase films were respectively fabricated by a pulsed laser deposition method and a subsequent rapid thermal annealing. The ceramics showed a frequency (10(2)-10(6) Hz) independent dielectric response with a colossal dielectric permittivity (similar to 30 000), and a relatively low dielectric loss (similar to 0.05) at room temperature. The excellent colossal permittivity properties are comparable to those of the previously reported rutile TiO2 ceramics by co-doping trivalent and pentavalent elements. For amorphous films, the dielectric permittivity decreased, and the dielectric loss increased slightly compared to those of the ceramics. Compared with the amorphous thin films, the annealed anatase ones exhibited a simultaneous increase in both dielectric permittivity and loss at low frequency while kept almost unchanged at high frequency. These results suggest that co-doping of bivalent elements with Nb into TiO2 with various phase structures can yield colossal permittivity effects, including ultra-high dielectric permittivity, relatively low dielectric loss. Furthermore, the colossal permittivity properties may be mainly attributed to the effect of the electron-pinned defect-dipoles in Zn, Nb co-doped TiO2 with different phase structures rather than the grain boundary capacitance effect. Besides, the frequency and bias dependent dielectric properties were also investigated in thin film forms, which could be affected by the electrode-film interface and mobile ions. Our results are helpful for not only investigating the new class of colossal permittivity materials, but also developing dielectric thin film device applications.
引用
收藏
页码:11005 / 11010
页数:6
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