Fine determination of interatomic distances on surface using extended energy-loss fine structure (EELFS) data: peculiarities of the technique

被引:15
作者
Wainstein, DL [1 ]
Kovalev, AI [1 ]
机构
[1] CNIICHERMET, Surface Phenomena Res Grp, Inst Met Phys, Moscow 107005, Russia
关键词
surface; atomic structure; AES; EELFS; segregation; diamond-like coatings;
D O I
10.1002/sia.1289
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
For determination of interatomic distances on a surface we use spectra below the lines of backscattered electrons and below the Auger lines. In contrast to other authors, who record spectra in dN/dE mode for extended energy-loss fine structure (EELFS) analysis, the integral N(E) mode is used with further filtering of the structure-dependent oscillations by original software. The sequence of structure-dependent oscillation extraction from the energy-loss spectrum is presented, including the following main stages: synthesis of peak and inelastic background and detection of inelastic oscillations; normalization of the inelastic spectrum; recalculation of the spectrum to K-space; and Fourier transformation. Good agreement between theoretical and experimentally obtained interatomic distances for various systems (multicomponent grain boundary segregations in steels, hard diamond-like coatings and films generated on the surface of cutting tools with engineered coatings) is observed. Detailed results of application of EELFS for investigation of the atomic structure of these systems are presented. In particular, the results of EELFS analysis of hard amorphous hydrogenated carbon films show the ability of this method to resolve interatomic bonds of different types (sp, sp(2), sp(3), aromatic bonds). The 'carbon-hydrogen' distances are also determined. Copyright (C) 2002 John Wiley Sons, Ltd.
引用
收藏
页码:230 / 233
页数:4
相关论文
共 9 条
[1]   EVIDENCE OF EXTENDED FINE-STRUCTURES IN THE AUGER-SPECTRA - A NEW APPROACH FOR SURFACE STRUCTURAL STUDIES [J].
DECRESCENZI, M ;
CHAINET, E ;
DERRIEN, J .
SOLID STATE COMMUNICATIONS, 1986, 57 (07) :487-490
[2]   STRUCTURAL DETERMINATION OF CRYSTALLINE SILICON BY EXTENDED ENERGY-LOSS FINE-STRUCTURE SPECTROSCOPY [J].
DECRESCENZI, M ;
LOZZI, L ;
PICOZZI, P ;
SANTUCCI, S ;
BENFATTO, M ;
NATOLI, CR .
PHYSICAL REVIEW B, 1989, 39 (12) :8409-8422
[3]  
FOXRABINOVICH GS, 1998, ELECT SPECTROSC RELA, V85, P65
[4]   Investigation of atomic and electronic structure of films generated on a cutting tool surface [J].
Kovalev, AI ;
Wainstein, DL ;
Mishina, VP ;
Fox-Rabinovich, GS .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1999, 105 (01) :63-75
[5]  
KOVALEV AI, 1990, VACUUM, V41, P1794
[6]   DATA-ANALYSIS TECHNIQUES IN X-RAY PHOTO-ELECTRON SPECTROSCOPY [J].
PROCTOR, A ;
SHERWOOD, PMA .
ANALYTICAL CHEMISTRY, 1982, 54 (01) :13-19
[7]  
SHERWOOD PMA, 1987, PRACTICAL SURFACE AN, P497
[8]  
WAINSTEIN DL, 2000, THESIS, P40
[9]   FINE-STRUCTURE IN AUGER-ELECTRON SPECTRA [J].
WOODRUFF, DP .
SURFACE SCIENCE, 1987, 189 :64-68