The effect of deposition parameters on the properties of surface layers

被引：0
|
作者：
Rzanek-Borocha, Zenobia [1 ]
Jozwik, Krzysztof [1 ]
Ilik, Aneta [1 ]
Kosinski, Andrzei [1 ]
机构：
[1] Warsaw Univ Sci & Technol, Wydzial Chem, PL-00664 Warsaw, Poland
来源：
PRZEMYSL CHEMICZNY | 2006年 / 85卷 / 8-9期
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Dielec. barrier discharges (5 kHz) were used (5 min/200 degrees C/ 1 atm.) to deposit 100-500 nm Si oxide coatings on < 111 > Si monocrystals (friction coeff., 0.2) from 1.1% trimethyl-methoxysilane (TMMOS) + 0.72% O-2 + He mixtures. Minor C amts. were left in the coatings. FTIR, XSP, AFM patterns and friction coeff. (0.5-0.7) data showed the coated surfaces to be smooth enough for micromech. appln. The 50 degrees C coats were moist and viscous.
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页码：748 / 750
页数：3
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