The effect of deposition parameters on the properties of surface layers

被引：0

作者：

Rzanek-Borocha, Zenobia ^{[1
]}

Jozwik, Krzysztof ^{[1
]}

Ilik, Aneta ^{[1
]}

Kosinski, Andrzei ^{[1
]}

机构：

[1] Warsaw Univ Sci & Technol, Wydzial Chem, PL-00664 Warsaw, Poland

来源：

PRZEMYSL CHEMICZNY | 2006年 / 85卷 / 8-9期

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Dielec. barrier discharges (5 kHz) were used (5 min/200 degrees C/ 1 atm.) to deposit 100-500 nm Si oxide coatings on < 111 > Si monocrystals (friction coeff., 0.2) from 1.1% trimethyl-methoxysilane (TMMOS) + 0.72% O-2 + He mixtures. Minor C amts. were left in the coatings. FTIR, XSP, AFM patterns and friction coeff. (0.5-0.7) data showed the coated surfaces to be smooth enough for micromech. appln. The 50 degrees C coats were moist and viscous.

引用

页码：748 / 750

页数：3

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