Extended X-ray absorption fine structure (EXAFS) of InN and InGaN

被引:0
作者
O'Donnell, KP [1 ]
Martin, RW
White, ME
Mosselmans, JFW
Guo, QX
机构
[1] Univ Strathclyde, Dept Phys & Appl Phys, Glasgow G4 0NG, Lanark, Scotland
[2] CLRC, Daresbury Lab, Daresbury WA4 4AD, Cheshire, England
[3] Saga Univ, Dept Elect & Elect Engn, Saga 8408502, Japan
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1999年 / 216卷 / 01期
关键词
D O I
10.1002/(SICI)1521-3951(199911)216:1<151::AID-PSSB151>3.0.CO;2-7
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We present extended X-ray absorption fine structure (EXAFS) spectra of sputtered indium nitride films. Disorder in the In local environment has been analysed with the aid of a two-shell fit to data for samples grown at three different substrate temperatures. An excellent fit to a model comprising the first five shells of neighbours is obtained for the best sample. The results of this study aid a reinterpretation of EXAFS data on a set of seven InGaN layers, grown by metallorganic chemical vapour deposition (MOCVD), with a wide range of indium content. In addition, we measured the fundamental bandgaps and Urbach tailing parameters of both sets of samples by optical absorption spectroscopy and attempt to relate structure and composition to the optical properties of the films.
引用
收藏
页码:151 / 156
页数:6
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