Influence of background gas ionization on oscillations in a virtual cathode with a retarding potential

被引：36

作者：

Filatov, R. A. ^{[1
]}

Hramov, A. E. ^{[1
]}

Bliokh, Y. P. ^{[2
]}

Koronovskii, A. A. ^{[1
]}

Felsteiner, J. ^{[2
]}

机构：

[1] Saratov NG Chernyshevskii State Univ, Fac Nonlinear Proc, Saratov 410012, Russia

[2] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel

来源：

PHYSICS OF PLASMAS | 2009年 / 16卷 / 03期

基金：

俄罗斯基础研究基金会;

关键词：

ionisation; plasma collision processes; plasma simulation; plasma transport processes; vircators; COLLECTIVE ION-ACCELERATION; NONRELATIVISTIC ELECTRON-BEAM; CHAOTIC OSCILLATIONS; PLASMA DIODES; DYNAMICS; SYSTEM; FLOW;

D O I：

10.1063/1.3080200

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The effect of mobile ion background on the dynamics of a planar virtual cathode with retarding field is investigated. The ions appear in the diode gap due to ionization of a neutral gas by the electron beam. Detailed examination of the self-consistent processes of the virtual cathode dynamics, gas ionization, and ions motion is performed using the particle-in-cell simulation. It is shown that the presence of ions leads to the virtual cathode neutralization, its displacement, and subsequent anew formation. The microwave generation has the form of a sequence of pulse packets, whose duration depends on the value of the retarding potential and the kind of gas.

引用

页数：6

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