Multi-mode resistive switching behaviors induced by modifying Ti interlayer thickness and operation scheme

被引:13
作者
Wang, M. J. [1 ]
Zeng, F. [1 ]
Gao, S. [1 ]
Song, C. [1 ]
Pan, F. [1 ]
机构
[1] Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
Resistive switching; Complementary; Self-compliance; HfO2; Ti interlayer; DENSITY MEMORY APPLICATION; SELF-COMPLIANCE; DOPED ZNO; DEVICES; BIPOLAR; RRAM; COEXISTENCE; MECHANISMS; NANOLAYER; FILMS;
D O I
10.1016/j.jallcom.2016.01.177
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
To overcome the practical issues existed in RRAMs application, complementary resistive switching (CRS) and self-compliance effect are investigated to alleviate sneak current issue and avoid external compliance current (I-comp), respectively. It is remarkable that the two resistive switching (RS) behaviors are attempted to achieve in the same system of Pt/HfO2(7.5-x)/Ti(2x)/HfO2(7.5-x)/Pt (x = 0, 2.5, 3.5 nm) device fabricated by magnetron sputtering, i.e., multi-mode resistive switching behaviors are modulated by varying Ti interlayer thickness and operation scheme, such as initial I-comp and applied voltage during reset switching. As indicated by the results, typical bipolar resistive switching (BRS) and CRS behaviors exhibit in Pt/HfO2(similar to 4 nm)/Ti(similar to 7 nm)/HfO2(similar to 4 nm)/Pt devices, and self-compliance effect appears in Pt/HfO2(similar to 5 nm)/Ti(similar to 5 nm)/HfO2(similar to 5 nm)/Pt devices. After investigated the conductive mechanisms, it is proposed adopting conceivable switching mechanism associated with the formation of oxygen vacancy (V-o) and metallic conduction filament (CF) to understand CRS and self-compliance effect. The exploration of multi-mode RS behaviors paves the way to improve the flexibility and convenience of RRAMs in actual application. (c) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:219 / 224
页数:6
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