Multi-mode resistive switching behaviors induced by modifying Ti interlayer thickness and operation scheme

被引:13
作者
Wang, M. J. [1 ]
Zeng, F. [1 ]
Gao, S. [1 ]
Song, C. [1 ]
Pan, F. [1 ]
机构
[1] Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
Resistive switching; Complementary; Self-compliance; HfO2; Ti interlayer; DENSITY MEMORY APPLICATION; SELF-COMPLIANCE; DOPED ZNO; DEVICES; BIPOLAR; RRAM; COEXISTENCE; MECHANISMS; NANOLAYER; FILMS;
D O I
10.1016/j.jallcom.2016.01.177
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
To overcome the practical issues existed in RRAMs application, complementary resistive switching (CRS) and self-compliance effect are investigated to alleviate sneak current issue and avoid external compliance current (I-comp), respectively. It is remarkable that the two resistive switching (RS) behaviors are attempted to achieve in the same system of Pt/HfO2(7.5-x)/Ti(2x)/HfO2(7.5-x)/Pt (x = 0, 2.5, 3.5 nm) device fabricated by magnetron sputtering, i.e., multi-mode resistive switching behaviors are modulated by varying Ti interlayer thickness and operation scheme, such as initial I-comp and applied voltage during reset switching. As indicated by the results, typical bipolar resistive switching (BRS) and CRS behaviors exhibit in Pt/HfO2(similar to 4 nm)/Ti(similar to 7 nm)/HfO2(similar to 4 nm)/Pt devices, and self-compliance effect appears in Pt/HfO2(similar to 5 nm)/Ti(similar to 5 nm)/HfO2(similar to 5 nm)/Pt devices. After investigated the conductive mechanisms, it is proposed adopting conceivable switching mechanism associated with the formation of oxygen vacancy (V-o) and metallic conduction filament (CF) to understand CRS and self-compliance effect. The exploration of multi-mode RS behaviors paves the way to improve the flexibility and convenience of RRAMs in actual application. (c) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:219 / 224
页数:6
相关论文
共 37 条
[1]   Investigation of thermal stability and reliability of HfO2 based resistive random access memory devices with cross-bar structure [J].
Chand, Umesh ;
Huang, Kuan-Chang ;
Huang, Chun-Yang ;
Ho, Chia-Hua ;
Lin, Chen-Hsi ;
Tseng, Tseung-Yuen .
JOURNAL OF APPLIED PHYSICS, 2015, 117 (18)
[2]   Bipolar resistive switching in Cu/AlN/Pt nonvolatile memory device [J].
Chen, C. ;
Yang, Y. C. ;
Zeng, F. ;
Pan, F. .
APPLIED PHYSICS LETTERS, 2010, 97 (08)
[3]   Effect of Electrode Materials on AlN-Based Bipolar and Complementary Resistive Switching [J].
Chen, Chao ;
Gao, Shuang ;
Tang, Guangsheng ;
Fu, Huadong ;
Wang, Guangyue ;
Song, Cheng ;
Zeng, Fei ;
Pan, Feng .
ACS APPLIED MATERIALS & INTERFACES, 2013, 5 (05) :1793-1799
[4]   Resistive Switching and Magnetic Modulation in Cobalt-Doped ZnO [J].
Chen, Guang ;
Song, Cheng ;
Chen, Chao ;
Gao, Shuang ;
Zeng, Fei ;
Pan, Feng .
ADVANCED MATERIALS, 2012, 24 (26) :3515-3520
[5]   Complementary switching on TiN/MgZnO/ZnO/Pt bipolar memory devices for nanocrossbar arrays [J].
Chen, Xinman ;
Hu, Wei ;
Wu, Shuxiang ;
Bao, Dinghua .
JOURNAL OF ALLOYS AND COMPOUNDS, 2014, 615 :566-568
[6]   Endurance/Retention Trade-off on HfO2/Metal Cap 1T1R Bipolar RRAM [J].
Chen, Yang Yin ;
Goux, Ludovic ;
Clima, Sergiu ;
Govoreanu, Bogdan ;
Degraeve, Robin ;
Kar, Gouri Sankar ;
Fantini, Andrea ;
Groeseneken, Guido ;
Wouters, Dirk J. ;
Jurczak, Malgorzata .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2013, 60 (03) :1114-1121
[7]   Novel Defects-Trapping TaOX/HfOX RRAM With Reliable Self-Compliance, High Nonlinearity, and Ultra-Low Current [J].
Chen, Yu-Sheng ;
Lee, Heng-Yuan ;
Chen, Pang-Shiu ;
Chen, Wei-Su ;
Tsai, Kan-Hsueh ;
Gu, Pei-Yi ;
Wu, Tai-Yuan ;
Tsai, Chen-Han ;
Rahaman, S. Z. ;
Lin, Yu-De ;
Chen, Frederick ;
Tsai, Ming-Jinn ;
Ku, Tzu-Kun .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (02) :202-204
[8]   Random telegraph noise and resistance switching analysis of oxide based resistive memory [J].
Choi, Shinhyun ;
Yang, Yuchao ;
Lu, Wei .
NANOSCALE, 2014, 6 (01) :400-404
[9]   Bipolar resistive switching characteristics of Al-doped zinc tin oxide for nonvolatile memory applications [J].
Fan, Yang-Shun ;
Liu, Po-Tsun ;
Teng, Li-Feng ;
Hsu, Ching-Hui .
APPLIED PHYSICS LETTERS, 2012, 101 (05)
[10]   Tuning the switching behavior of binary oxide-based resistive memory devices by inserting an ultra-thin chemically active metal nanolayer: a case study on the Ta2O5-Ta system [J].
Gao, Shuang ;
Zeng, Fei ;
Wang, Minjuan ;
Wang, Guangyue ;
Song, Cheng ;
Pan, Feng .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2015, 17 (19) :12849-12856