共 3 条
Multi-mode resistive switching behaviors induced by modifying Ti interlayer thickness and operation scheme
被引:13
作者:
Wang, M. J.
[1
]
Zeng, F.
[1
]
Gao, S.
[1
]
Song, C.
[1
]
Pan, F.
[1
]
机构:
[1] Tsinghua Univ, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Resistive switching;
Complementary;
Self-compliance;
HfO2;
Ti interlayer;
DENSITY MEMORY APPLICATION;
SELF-COMPLIANCE;
DOPED ZNO;
DEVICES;
BIPOLAR;
RRAM;
COEXISTENCE;
MECHANISMS;
NANOLAYER;
FILMS;
D O I:
10.1016/j.jallcom.2016.01.177
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
To overcome the practical issues existed in RRAMs application, complementary resistive switching (CRS) and self-compliance effect are investigated to alleviate sneak current issue and avoid external compliance current (I-comp), respectively. It is remarkable that the two resistive switching (RS) behaviors are attempted to achieve in the same system of Pt/HfO2(7.5-x)/Ti(2x)/HfO2(7.5-x)/Pt (x = 0, 2.5, 3.5 nm) device fabricated by magnetron sputtering, i.e., multi-mode resistive switching behaviors are modulated by varying Ti interlayer thickness and operation scheme, such as initial I-comp and applied voltage during reset switching. As indicated by the results, typical bipolar resistive switching (BRS) and CRS behaviors exhibit in Pt/HfO2(similar to 4 nm)/Ti(similar to 7 nm)/HfO2(similar to 4 nm)/Pt devices, and self-compliance effect appears in Pt/HfO2(similar to 5 nm)/Ti(similar to 5 nm)/HfO2(similar to 5 nm)/Pt devices. After investigated the conductive mechanisms, it is proposed adopting conceivable switching mechanism associated with the formation of oxygen vacancy (V-o) and metallic conduction filament (CF) to understand CRS and self-compliance effect. The exploration of multi-mode RS behaviors paves the way to improve the flexibility and convenience of RRAMs in actual application. (c) 2016 Elsevier B.V. All rights reserved.
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页码:219 / 224
页数:6
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