Raman and electron paramagnetic resonance studies of spark-processed Si and Ge

被引:2
作者
Chang, SS [1 ]
Bowmaker, GA
机构
[1] Kangnung Natl Univ, Dept Ceram Engn, Kangwon Do 210702, Kangnung, South Korea
[2] Univ Auckland, Dept Chem, Auckland 1, New Zealand
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2002年 / 95卷 / 03期
关键词
photoluminescence; semiconductor; electron paramagnetic resonance; Raman spectroscopy;
D O I
10.1016/S0921-5107(02)00289-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Raman and electron paramagnetic resonance (EPR) spectra are investigated on spark-processed Si (sp-Si) and Ge (sp-Ge), which strongly luminesce in the UV/blue and green regions of the visible spectrum. The observed small shifts and broadening of the Raman signal indicate the presence of Si, and Ge particles of about 8 nm. The EPR studies revealed two distinct paramagnetic defect centers for the UV/blue luminescing sp-Si, whereas only one paramagnetic defect with reduced EPR intensity was observed for the green luminescing sp-Si. Further, no paramagnetic defect was observed for sp-Ge. The determined g-factor for spark-processed green luminescing Si and for the strongest signal in UV/blue luminescing Si was 2.0071. EPR analysis indicates that no correlation is observed for the PL intensity and electron paramagnetic defect concentration from sp-Si, and Ge. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:290 / 294
页数:5
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