The effect of crystal structure and morphology on the optical properties of chromium nitride thin films

被引:20
作者
Logothetidis, S [1 ]
Patsalas, P [1 ]
Sarakinos, K [1 ]
Charitidis, C [1 ]
Metaxa, C [1 ]
机构
[1] Aristotle Univ Thessaloniki, Solid State Phys Sect, Dept Phys, GR-54124 Thessaloniki, Greece
关键词
mononitrides; spectroscopic ellipsometry; X-ray diffraction; grain growth;
D O I
10.1016/j.surfcoat.2003.10.108
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We study the microstructure of various CrxNy (1 < x < 2, y similar to 1) coatings grown by unbalanced reactive magnetron sputtering (UBRMS), using X-ray diffraction (XRD) and reflectivity (XRR). The coatings consist of various Cr-N phases, depending on the growth conditions. XRD has shown that a Cr adhesion layer below CrxNy eliminates the stress and promotes the growth of bigger grains. XRR determined the film density, which can be used also for the phase identification. We found that the UBRMS can produce single-phase CrN and Cr2N coatings with density equivalent to the corresponding single-crystals. The optical properties of the coatings were studied by spectroscopic ellipsometry (SE). The variations of optical properties of CrxNy coatings have been evaluated from SE data using the combined Drude-Lorentz model, which describes the optical response of the conduction and valence electrons, respectively, and provides the conduction electron density and the energy positions of the interband transitions. Finally, the optical properties were used to quantify the volume fractions of each phase using effective medium theories. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:637 / 641
页数:5
相关论文
共 13 条
[1]   Spectroscopic ellipsometry measurements of chromium nitride coatings [J].
Aouadi, SM ;
Mihut, DM ;
Kuruppu, ML ;
Kirkpatrick, SR ;
Rohde, SL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (06) :2800-2804
[2]   Properties of reactively RF magnetron-sputtered chromium nitride coatings [J].
Bertrand, G ;
Savall, C ;
Meunier, C .
SURFACE & COATINGS TECHNOLOGY, 1997, 96 (2-3) :323-329
[3]   Band gap in epitaxial NaCl-structure CrN(001) layers [J].
Gall, D ;
Shin, CS ;
Haasch, RT ;
Petrov, I ;
Greene, JE .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (09) :5882-5886
[4]  
Glocker D.A., 1995, Handbook of Thin Film Process Technology
[5]   BAND-STRUCTURE AND COHESIVE PROPERTIES OF 3D-TRANSITION-METAL CARBIDES AND NITRIDES WITH THE NACL-TYPE STRUCTURE [J].
HAGLUND, J ;
GRIMVALL, G ;
JARLBORG, T ;
GUILLERMET, AF .
PHYSICAL REVIEW B, 1991, 43 (18) :14400-14408
[6]   Thermal stability of nitride thin films [J].
Hultman, L .
VACUUM, 2000, 57 (01) :1-30
[7]   Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures [J].
Navinsek, B ;
Panjan, P ;
Milosev, I .
SURFACE & COATINGS TECHNOLOGY, 1997, 97 (1-3) :182-191
[8]   ELECTRONIC-PROPERTIES OF TRANSITION-METAL NITRIDES - THE GROUP-V AND GROUP-VI NITRIDES VN, NBN, TAN, CRN, MON, AND WN [J].
PAPACONSTANTOPOULOS, DA ;
PICKETT, WE ;
KLEIN, BM ;
BOYER, LL .
PHYSICAL REVIEW B, 1985, 31 (02) :752-761
[9]   ANOMALOUS DISPERSION AND SCATTERING OF X-RAYS [J].
PARRATT, LG ;
HEMPSTEAD, CF .
PHYSICAL REVIEW, 1954, 94 (06) :1593-1600
[10]   Interface properties and structural evolution of TiN/Si and TiN/GaN heterostructures [J].
Patsalas, P ;
Logothetidis, S .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (02) :989-998