Electron-beam-induced dissociation of B-D complexes in diamond

被引:19
作者
Barjon, J.
Chevallier, J.
Jomard, F.
Baron, C.
Deneuville, A.
机构
[1] Univ Versailles, CNRS, Grp Etud Mat Condensee, GEMaC, F-92195 Meudon, France
[2] LEPES, LEPES, F-38042 Grenoble, France
关键词
D O I
10.1063/1.2400201
中图分类号
O59 [应用物理学];
学科分类号
摘要
The diffusion of deuterium in boron-doped homoepitaxial diamond films leads to the passivation of boron acceptors via the formation of B-D complexes. In this letter, the stability of B-D pairs is investigated under the stress of a low-energy (10 keV) electron-beam irradiation at low temperature (similar to 100 K). The dissociation of the complexes is evidenced by cathodoluminescence spectroscopy and is shown to result in the reactivation of most acceptors. The dissociation yield per incident electron is found to be strongly dependent on the e-beam current, which suggests a dissociation involving a vibrational excitation of the complexes by hot electrons. (c) 2006 American Institute of Physics.
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页数:3
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