Fabrication of ordered arrays of silicon nanopillars

被引：36

作者：

Seeger, K ^{[1
]}

Palmer, RE ^{[1
]}

机构：

[1] Univ Birmingham, Sch Phys & Astron, Nanoscale Phys Res Lab, Birmingham B15 2TT, W Midlands, England

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1999年 / 32卷 / 24期

关键词：

D O I：

10.1088/0022-3727/32/24/102

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the fabrication of ordered arrays of silicon nanopillars via reactive ion etching (RIE). Self-assembled polymer spheres are used as masks for the deposition of hexagonal arrays of Ag islands on a silicon substrate. Following the removal of the polymer spheres, the sample is etched with SF6 and CF4 at 100 W leading to hexagonal arrays of silicon nanopillars. The aspect ratio of the pillars can be influenced by the etching time; maximum aspect ratios of 15:1 have been produced.

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页码：L129 / L132

页数：4

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