Microstructure of Al-alloy surface implanted with high-dose nitrogen

被引：5

作者：

Hara, Y ^{[1
]}

Yamanishi, T ^{[1
]}

Azuma, K ^{[1
]}

Uchida, H ^{[1
]}

Yatsuzuka, M ^{[1
]}

机构：

[1] Himeji Inst Technol, Himeji, Hyogo 6712201, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 156卷 / 1-3期

关键词：

plasma-based ion implantation (PBII); AlN; AFM analysis; roughness; sputtering; casting aluminum alloy;

D O I：

10.1016/S0257-8972(02)00123-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Nitrogen ion implantation by plasma-based ion implantation with a negative bias voltage of 10 kV led to the formation of AlN on the surface layer of a casting aluminum alloy (Al-7Si) sample. The AES analysis of the ion-implanted sample indicated that the depth profile of nitrogen ions implanted at room temperature was approximated by a Gaussian profile with a center of ion range (27 nm). The AFM observation showed the changes in surface morphology with nitrogen ion implantation. The surface roughness of the unimplanted sample. which was mechanically polished before ion implantation, had a mean-average roughness of R-a = 13.9 nm. After implantation. on the other hand, the surface roughness decreased with increasing the ion dose, and was reduced to R-a = 8.2 nm at a dose of 2.2X10(18) cm(-2). Plasma ion implantation led to both implantation and smoothing simultaneously. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：166 / 169

页数：4

共 5 条

[1] PLASMA SOURCE ION-IMPLANTATION TECHNIQUE FOR SURFACE MODIFICATION OF MATERIALS [J].