Study on surface chemistry and particle size of porous silicon prepared by electrochemical etching

被引：20

作者：

Maniya, Nalin H. ^{[1
]}

Patel, Sanjaykumar R. ^{[1
]}

Murthy, Z. V. P. ^{[1
]}

机构：

[1] Sardar Vallabhbhai Natl Inst Technol, Dept Chem Engn, Surat 395007, Gujarat, India

来源：

MATERIALS RESEARCH BULLETIN | 2014年 / 57卷

关键词：

Nanostructures; Optical properties; Electron microscopy; Infrared spectroscopy; Surface properties; MESOPOROUS SILICON; DELIVERY; PEPTIDE; MICROPARTICLES;

D O I：

10.1016/j.materresbull.2014.05.014

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In the present study, surface chemistry of porous silicon was tailored by thermal oxidation and thermal hydrosilylation method. Porous silicon nanoparticles were prepared by applying ultrasound to freestanding porous silicon films. The results showed a mesoporous silicon layer with an average pore diameter of 28.26 nm, porosity of 70.7% and thickness of 4660 nm. Porous silicon surface was modified and compared with native surface by Fourier transform infrared spectroscopy. Ultrasonic fracture of porous silicon films for 8 h resulted in nanoparticles with average particle size of 149 nm. Zeta potential measurements of nanoparticles at varying pH reveal presence of different surface chemistry of particles. (C) 2014 Elsevier Ltd. All rights reserved.

引用

页码：6 / 12

页数：7

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