Impact of Cell Topology on Characteristics of 600V 4H-SiC Planar MOSFETs

被引:25
作者
Agarwal, Aditi [1 ]
Han, Kijeong [1 ]
Baliga, B. Jayant [1 ]
机构
[1] North Carolina State Univ, PowerAmer Inst, Raleigh, NC 27695 USA
关键词
4H-SiC; 600; V; cell topologies; C-gd; hexagonal layout; linear layout; octagonal layout; planar MOSFET; Q(gd); R-on; R-sp; silicon carbide; square layout;
D O I
10.1109/LED.2019.2908078
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter compares the measured electrical characteristics of 600 V planar-gate inversion-channel 4H-SiC power MOSFETs fabricated with four different cell topologies (Linear, Square, Hexagonal, and Octagonal) for the first time. The High-Frequency Figures-of-Merit (HF-FOMs) of these devices were compared with the commercially available SiC device and the Si CoolMOS product. It was found that the HF-FOMs of the 600-V SiC product and our fabricated conventional Linear cell device are much worse in comparison to the Si CoolMOS product. However, the 600 V SiC power MOSFET with comparable performance to the Si CoolMOS product could be achieved by using the Octagonal cell topology.
引用
收藏
页码:773 / 776
页数:4
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