Effects of Kr, N2, and Ar on address discharge time lag in AC plasma-display panel with high xenon content

被引:7
作者
Choi, Kyung Cheol [1 ]
Kim, Sang Ho
Shin, Bhum Jae
Kang, Jungwon
Choi, Kwang-Yeol
Yoo, Eun-Ho
机构
[1] Korea Adv Inst Sci & Technol, Dept Elect Engn & Comp Sci, Taejon 305701, South Korea
[2] Sejong Univ, Dept Elect Engn, Seoul 143747, South Korea
[3] Dankook Univ, Sch Elect Elect & Comp Engn, Seoul 140714, South Korea
[4] LG Elect Inc, PDP Grp, Digital Display Res Lab, Seoul 137724, South Korea
关键词
argon; discharge time lag; krypton; nitrogen; plasma-display panel (PDP);
D O I
10.1109/TED.2006.880814
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The additive gas effect on the discharge time lag of the address pulse was investigated in an ac plasma-display panel (PDP) with a Ne + 13% Xe gas mixture. A small amount of Kr, N-2, and Ar gas, respectively, was added to a Ne + 13% Xe gas mixture to improve the address discharge time lag of an ac PDP. It was found that the address discharge time lag was improved by adding a small amount of Kr gas (up to 2%) to the Ne + 13% Xe gas mixture and thereafter worsened. In the case of the addition of Ar gas to Ne + 13% Xe, the discharge time lag of the address pulse was not improved. The concentration of N-2 in the Ne + 13% Xe gas mixture was varied from 0.013% to 0.187%, and its effects on the address discharge time lag were investigated. The time lag for the address discharge with a Ne + 13% Xe + 0.013% N-2 gas mixture was improved.
引用
收藏
页码:2410 / 2413
页数:4
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