Degradation Characteristics of Normally-Off p-AlGaN Gate AlGaN/GaN HEMTs With 5 MeV Proton Irradiation

被引:14
作者
Keum, Dong Min [1 ]
Sung, Hyuk-kee [1 ]
Kim, Hyungtak [1 ]
机构
[1] Hongik Univ, Sch Elect & Elect Engn, Seoul 04066, South Korea
基金
新加坡国家研究基金会;
关键词
AlGaN/GaN; displacement damage; high electron mobility transistors; hole; irradiation; normally-off; p-AlGaN; proton; ELECTRON-MOBILITY; INDUCED CHARGE; GAN HEMT;
D O I
10.1109/TNS.2016.2612227
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Proton irradiation at 5 MeV was performed on normally-off p-AlGaN gate AlGaN/GaN high electron mobility transistors (HEMTs). The increase of on-resistance and the degradation of subthreshold characteristics were observed after irradiation. The reduction of on-current was induced by displacement damage which also affected ungated devices with no p-AlGaN gate layer. Thermal annealing partially recovered this reduction. The subthreshold degradation with the threshold voltage (V-th) shift was proportional to the irradiation dose. TCAD simulation indicated that the decrease of hole concentration in p-AlGaN layer resulted in the negative shift of V-th and the subthreshold degradation.
引用
收藏
页码:258 / 262
页数:5
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