Investigation of the possibility of unfiltered aluminium vacuum arc plasma application for high-frequency short-pulse plasma immersion ion implantation

被引：3

作者：

Sivin, D. O. ^{[1
]}

Ryabchikov, A. I. ^{[1
]}

Bumagina, A. I. ^{[1
]}

Bolbasov, E. N. ^{[1
]}

Daneikina, N. V. ^{[1
]}

机构：

[1] Natl Res Tomsk Polytech Univ, Tomsk 634050, Russia

来源：

APPLIED SURFACE SCIENCE | 2014年 / 310卷

关键词：

Vacuum-arc; Aluminium plasma; Intermetallic compounds; Macroparticles; Negative high-frequency short-pulsed bias; PHASE-FORMATION;

D O I：

10.1016/j.apsusc.2014.03.129

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This paper is devoted to the study of the possibilities of unfiltered aluminium vacuum arc plasma application for intermetallic layers formation using the high-frequency short-pulse plasma immersion ion implantation method. It is shown experimentally that the number density of aluminium macroparticles (MPs) on the substrate surface is decreased dramatically by 3 orders of magnitude when the ion-plasma substrate treatment time is increased from 30 s to 3 min at the bias potential -2 kV. It was shown that at high intensity low energy plasma immersion implantation of Al ions in Ti and Ni substrates a deep layer (several mu m) of aluminium dopants with concentration in the range of (12-35) at% can be formed. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：120 / 125

页数：6

共 15 条

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