Postgrowth Tuning of the Bandgap of Single-Layer Molybdenum Disulfide Films by Sulfur/Selenium Exchange

被引:108
|
作者
Ma, Quan [1 ]
Isarraraz, Miguel [1 ]
Wang, Chen S. [1 ]
Preciado, Edwin [1 ]
Klee, Velveth [1 ]
Bobek, Sarah [1 ]
Yamaguchi, Koichi [1 ]
Li, Emily [1 ]
Odenthal, Patrick Michael [1 ]
Ariana Nguyen [1 ]
Barroso, David [1 ]
Sun, Dezheng [1 ,3 ,4 ]
Palacio, Gretel von Son [1 ]
Gomez, Michael [1 ]
Andrew Nguyen [1 ]
Le, Duy [2 ]
Pawin, Greg [1 ]
Mann, John [1 ]
Heinz, Tony F. [3 ,4 ]
Rahman, Talat Shahnaz [2 ]
Bartels, Ludwig [1 ]
机构
[1] Univ Calif Riverside, Riverside, CA 92521 USA
[2] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[3] Columbia Univ, Dept Phys, New York, NY 10027 USA
[4] Columbia Univ, Dept Elect Engn, New York, NY 10027 USA
基金
美国国家科学基金会;
关键词
molybdenum disulfide; molybdenum diselenide; transition metal dichalcogenides; CVD; sputtering; bandgap engineering; atomically thin films; VALLEY POLARIZATION; MONOLAYER MOS2; PHOTOLUMINESCENCE; GROWTH; PHASE;
D O I
10.1021/nn5004327
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate bandgap tuning of a single-layer MoS2 film on SiO2/Si via substitution of its sulfur atoms by selenium through a process of gentle sputtering, exposure to a selenium precursor, and annealing. We characterize the substitution process both for S/S and S/Se replacement Photoluminescence and, in the latter case, X-ray photoelectron spectroscopy provide direct evidence of optical band gap shift and selenium incorporation, respectively. We discuss our experimental observations, including the limit of the achievable bandgap shift, in terms of the role of stress in the film as elucidated by computational studies, based on density functional theory. The resultant films are stable in vacuum, but deteriorate under optical excitation In air.
引用
收藏
页码:4672 / 4677
页数:6
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