Substrate impact on optical and microstructural properties of TiO2-PEG sol-gel films

Nanosized TiO2 layers containing polyethylene glycol (PEG) with 20,000 molecular weight were prepared by sol gel method and deposited on three different substrates: microscope standard slides, Fluorine doped Tin Oxide (FTO) glass and Silicon, followed by thermal treatment at 450 degrees C. The effects of the substrate on the microstructural, morphological, chemical and optical properties of the films have been studied by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), High Resolution Transmission Electron Microscopy (HRTEM), Atomic Force Microscopy (AFM), X-ray Photo-electron Spectroscopy (XPS) and Spectroscopic Ellipsometry (SE). The XRD showed that the film crystallization depends very much on the substrate used, thus the films deposited on glass are amorphous even after 1 h thermal treatment at 450 degrees C, while the films deposited on Silicon and FTO substrates are crystallized in anatase phase, in good agreement with the TEM analysis. The XPS analysis showed that a rather high carbon relative concentration in the TiO2 film (without PEG) exists; this suggests that an unavoidable carbon contamination occurs and is not related on the presence or absence of PEG. The thickness and surface roughness of the films are clearly dependent on the substrate type. The flat surfaces of glass and Si lead to the formation of thinner TiO2 films (around 30 nm thicknesses), while the FTO substrate surface leads to thicker film (thickness similar to 100 nm). The porosity of TiO2 films as found by SEM and TEM analyzes is dependent of substrate type; small pore sizes up to 20 nm are characteristic for the films deposited on glass, while larger pore sizes up to 200 nm are found for the films deposited on FTO substrate. Not least, the film transmissions in the visible region are also substrate dependent and the highest values (80%) were obtained for the films deposited on glass. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.