Influence of the noble gas mixture composition on the performance of a plasma display panel

被引:43
作者
Gillies, MF [1 ]
Oversluizen, G [1 ]
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
D O I
10.1063/1.1465102
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of the noble gas mixture composition on the plasma display panel performance is investigated in test panels with a design which resembles the one used in commercial panels. Single gases and binary and ternary mixtures of He, Ne, Ar, Kr, and Xe are applied, where the Xe concentration is varied from 0% to 100%. The performance is characterized in terms of the panel luminance, efficacy, and discharge voltages. It is found that while an increase in efficacy and luminance can be achieved in several multicomponent mixtures it is necessary to examine the associated increase in the firing voltage, V-f. If one considers the luminance versus V-f dependence, then binary NexXe1-x mixtures are optimal to achieve the highest efficacy values at the lowest V-f. The maximum efficacy gain factor in high Xe partial pressure mixtures is about a factor of 3 with respect to the mixture applied in default commercial panels. (C) 2002 American Institute of Physics.
引用
收藏
页码:6315 / 6320
页数:6
相关论文
共 29 条
[1]  
AMEMIYA K, 1998, P 5 INT DISPL WORKSH, P531
[2]   Secondary emission of dielectrics used in plasma display panels [J].
Auday, G ;
Guillot, P ;
Galy, J .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (08) :4871-4874
[3]  
BECHTEL H, 1998, P 5 INT DISPL WORKSH, P527
[4]  
DOYEUX H, 1997, SID 97, P213
[5]   THEORY OF AUGER NEUTRALIZATION OF IONS AT SURFACE OF A DIAMOND-TYPE SEMICONDUCTOR [J].
HAGSTRUM, HD .
PHYSICAL REVIEW, 1961, 122 (01) :83-+
[6]  
Hirech A., 1997, XXIII International Conference on Phenomena in Ionized Gases, ICPIG Proceedings. Contributed Papers, P100
[7]  
Klein MH, 2000, IEICE T ELECTRON, VE83C, P1602
[8]   Townsend's ionization coefficients for neon, argon, krypton and xenon [J].
Kruithof, AA .
PHYSICA, 1940, 7 :519-540
[9]   NUMERICAL-MODEL OF AN AC PLASMA DISPLAY PANEL CELL IN NEON-XENON MIXTURES [J].
MEUNIER, J ;
BELENGUER, P ;
BOEUF, JP .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) :731-745
[10]   SATURATION OF ZN2SIO4 - MN LUMINESCENCE UNDER INTENSE VUV EXCITATION [J].
MIKOSHIBA, S ;
SHIRAI, S ;
SHINADA, S ;
FUKUSHIMA, M .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :1088-1090