Optical emission spectroscopy for diagnosis of diamond growth and etching processes in microwave plasma

被引：1

作者：

Yurov, V. Yu. ^{[1
,2
]}

Bushuev, E. V. ^{[1
]}

Bolshakov, A. P. ^{[1
,2
,3
]}

Antonova, I. A. ^{[1
,2
]}

Ralchenko, V. G. ^{[1
,2
,3
]}

Konov, V. I. ^{[1
,2
]}

机构：

[1] RAS, Gen Phys Inst, Moscow 119991, Russia

[2] Natl Res Nucl Univ MEPhI, Moscow 115409, Russia

[3] Harbin Inst Technol, Harbin 150001, Heilongjiang, Peoples R China

来源：

10TH INTERNATIONAL WORKSHOP 2017 STRONG MICROWAVES AND TERAHERTZ WAVES: SOURCES AND APPLICATIONS | 2017年 / 149卷

基金：

俄罗斯科学基金会;

关键词：

SINGLE-CRYSTAL DIAMOND; TEMPERATURE; DEPOSITION; DENSITY;

D O I：

10.1051/epjconf/201714902013

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页数：2

共 8 条

[1] High-rate growth of single crystal diamond in microwave plasma in CH4/H2 and CH4/H2/Ar gas mixtures in presence of intensive soot formation [J].

Bolshakov, A. P. ;

Ralchenko, V. G. ;

Yurov, V. Y. ;

Popovich, A. F. ;

Antonova, I. A. ;

Khomich, A. A. ;

Ashkinazi, E. E. ;

Ryzhkov, S. G. ;

Vlasov, A. V. ;

Khomich, A. V. .

[2] Express in situ measurement of epitaxial CVD diamond film growth kinetics [J].

Bushuev, E. V. ;

Yurov, V. Yu. ;

Bolshakov, A. P. ;

Ralchenko, V. G. ;

Khomich, A. A. ;

Antonova, I. A. ;

Ashkinazi, E. E. ;

Shershulin, V. A. ;

Pashinin, V. P. ;

Konov, V. I. .

[3] Synthesis of single crystal diamond by microwave plasma assisted chemical vapor deposition with in situ low-coherence interferometric control of growth rate [J].

Bushuev, E. V. ;

Yurov, V. Yu. ;

Bolshakov, A. P. ;

Ralchenko, V. G. ;

Ashkinazi, E. E. ;

Ryabova, A. V. ;

Antonova, I. A. ;

Volkov, P. V. ;

Goryunov, A. V. ;

Luk'yanov, A. Yu. .

[4] Rotational temperature measurements of excited and ground states of C2(d3Πg-a3Πu) transition in a H2/CH4 915 MHz microwave pulsed plasma [J].

Duten, X ;

Rousseau, A ;

Gicquel, A ;

Leprince, P .

JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) :5299-5301

[5] Method of power density determination in microwave discharge, sustained in hydrogen-methane gas mixture [J].

Lobaev, M. A. ;

Bogdanov, S. A. ;

Radishev, D. B. ;

Vikharev, A. L. ;

Gorbachev, A. M. .

[6] Determination of gas temperature and C2 absolute density in Ar/H2/CH4 microwave discharges used for nanocrystalline diamond deposition from the C2 Mulliken system [J].

Lombardi, G ;

Bénédic, F ;

Mohasseb, F ;

Hassouni, K ;

Gicquel, A .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (03) :375-386

[7] Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition [J].

Ma, Jie ;

Ashfold, Michael N. R. ;

Mankelevich, Yuri A. .

JOURNAL OF APPLIED PHYSICS, 2009, 105 (04)

[8] Probing the plasma chemistry in a microwave reactor used for diamond chemical vapor deposition by cavity ring down spectroscopy [J].

Ma, Jie ;

Richley, James C. ;

Ashfold, Michael N. R. ;

Mankelevich, Yuri A. .

JOURNAL OF APPLIED PHYSICS, 2008, 104 (10)

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