Oxygen vacancy defects in Ta2O5 showing long-range atomic re-arrangements

被引:41
作者
Guo, Yuzheng [1 ]
Robertson, John [1 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
基金
英国工程与自然科学研究理事会;
关键词
DIELECTRIC-CONSTANT; THIN-FILMS; TANTALUM PENTOXIDE; 1ST PRINCIPLES; OXIDE; MECHANISM; MEMORY; CHALLENGES; SYSTEM; TIO2;
D O I
10.1063/1.4869553
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structure, formation energy, and energy levels of the various oxygen vacancies in Ta2O5 have been calculated using the lambda phase model. The intra-layer vacancies give rise to unusual, long-range bonding rearrangements, which are different for each defect charge state. The 2-fold coordinated intra-layer vacancy is the lowest cost vacancy and forms a deep level 1.5 eV below the conduction band edge. The 3-fold intra-layer vacancy and the 2-fold inter-layer vacancy are higher cost defects, and form shallower levels. The unusual bonding rearrangements lead to low oxygen migration barriers, which are useful for resistive random access memory applications. (C) 2014 AIP Publishing LLC.
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页数:5
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共 40 条
[1]   Write current reduction in transition metal oxide based resistance-change memory [J].
Ahn, Seung-Eon ;
Lee, Myoung-Jae ;
Park, Youngsoo ;
Kang, Bo Soo ;
Lee, Chang Bum ;
Kim, Ki Hwan ;
Seo, Sunae ;
Suh, Dong-Seok ;
Kim, Dong-Chirl ;
Hur, Jihyun ;
Xianyu, Wenxu ;
Stefanovich, Genrikh ;
Yin, Hit. Axiang ;
Yoo, In-Kyeong ;
Lee, Atng-Hyun ;
Park, Jong-Bong ;
Baek, In-Gyu ;
Park, Bae Ho .
ADVANCED MATERIALS, 2008, 20 (05) :924-+
[2]   Rietveld analysis of X-ray diffraction pattern from β-Ta2O5 oxide [J].
Aleshina, LA ;
Loginova, SV .
CRYSTALLOGRAPHY REPORTS, 2002, 47 (03) :415-419
[3]   INFINITELY ADAPTIVE STRUCTURES [J].
ANDERSON, JS .
JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 1973, (10) :1107-1115
[4]   Ta2O5 polymorphs: Structural motifs and dielectric constant from first principles [J].
Andreoni, Wanda ;
Pignedoli, Carlo A. .
APPLIED PHYSICS LETTERS, 2010, 96 (06)
[5]  
[Anonymous], 2000, J VAC SCI TECHNOL B, V18, P1785
[6]   Challenges of Ta2O5 as high-k dielectric for nanoscale DRAMs [J].
Atanassova, E. ;
Paskaleva, A. .
MICROELECTRONICS RELIABILITY, 2007, 47 (06) :913-923
[7]   Electrical conductivity in oxygen-deficient phases of tantalum pentoxide from first-principles calculations [J].
Bondi, Robert J. ;
Desjarlais, Michael P. ;
Thompson, Aidan P. ;
Brennecka, Geoff L. ;
Marinella, Matthew J. .
JOURNAL OF APPLIED PHYSICS, 2013, 114 (20)
[8]   A PROPOSED STRUCTURE FOR ANNEALED ANODIC OXIDE FILMS OF TANTALUM [J].
CALVERT, LD ;
DRAPER, PHG .
CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1962, 40 (10) :1943-&
[9]   ENHANCEMENT OF THE DIELECTRIC-CONSTANT OF TA2O5 THROUGH SUBSTITUTION WITH TIO2 [J].
CAVA, RF ;
PECK, WF ;
KRAJEWSKI, JJ .
NATURE, 1995, 377 (6546) :215-217
[10]   Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications [J].
Chaneliere, C ;
Autran, JL ;
Devine, RAB ;
Balland, B .
MATERIALS SCIENCE & ENGINEERING R-REPORTS, 1998, 22 (06) :269-322