Boron nitride films synthesized by RF plasma CVD of borane-ammonia and nitrogen

被引：17

作者：

Deb, B ^{[1
]}

Bhattacharjee, B ^{[1
]}

Ganguli, A ^{[1
]}

Chaudhuri, S ^{[1
]}

Pal, AK ^{[1
]}

机构：

[1] Indian Assoc Cultivat Sci, Dept Mat Sci, Kolkata 700032, W Bengal, India

来源：

MATERIALS CHEMISTRY AND PHYSICS | 2002年 / 76卷 / 02期

关键词：

boron nitride; RF plasma CVD; FTIR;

D O I：

10.1016/S0254-0584(01)00524-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Boron nitride films were deposited at different substrate temperatures (623-773 K) on Si and quartz (fused silica) substrates by RF plasma chemical vapour deposition technique using borane-ammonia and nitrogen as the precursor gases. FTIR studies indicated the films to contain mixed phases of c-BN and h-BN and the percentage of c-BN (35-53%) was dependent on the deposition environment. The optimum deposition condition for obtaining higher c-BN phase was ascertained. The surface textures of the films were observed by scanning electron microscope and atomic force microscope. The optical properties of the films were studied to determine the optical constants (refractive index and bandgap). (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：130 / 136

页数：7

共 44 条

[21] Effects of nitrogen gas ratio on magnetron sputtering deposited boron nitride films [J].

Wang, Chuanbin ;

Luo, Xiaoshuang ;

Zhang, Song ;

Shen, Qiang ;

Zhang, Lianmeng .

VACUUM, 2014, 103 :68-71

[22] Low-temperature deposition of SiCN thin films by RF plasma CVD method [J].

Kumadaki, Masahiko ;

Yoshino, Masaki ;

Sato, Kohki ;

Itoh, Hidenori .

IEEJ Transactions on Fundamentals and Materials, 2014, 134 (10) :538-544

[23] Preparation of B-C-N thin films by rf plasma assisted CVD [J].

Polo, MC ;

Martinez, E ;

Esteve, J ;

Andujar, JL .

[24] Characterization and field emission of sulfur-doped boron nitride synthesized by plasma-assisted chemical vapor deposition [J].

Sugino, T ;

Tanioka, K ;

Kawasaki, S ;

Shirafuji, J .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (4B) :L463-L466

[25] Sol-gel synthesized boron nitride (BN) thin films for antibacterial and magnetic applications [J].

Kayani, Zohra Nazir ;

Bashir, Zainab ;

Mohsin, Munazza ;

Riaz, Saira ;

Naseem, Shahzad .

OPTIK, 2021, 243

[26] Deposition time influence on cubic boron nitride thin films by tuned rf magnetron sputtering [J].

Gimeno, S ;

Munoz, JC ;

Lousa, A .

THIN SOLID FILMS, 1998, 317 (1-2) :376-379

[27] Stability and degradation of plasma deposited boron nitride thin films in ambient atmosphere [J].

Anutgan, Tamila Aliyeva ;

Anutgan, Mustafa ;

Atilgan, Ismail ;

Katircioglu, Bayram .

THIN SOLID FILMS, 2009, 518 (01) :419-425

[28] Characterization of surface modification mechanisms for boron nitride films under plasma exposure [J].

Higuchi, Tomoya ;

Noma, Masao ;

Yamashita, Michiru ;

Urabe, Keiichiro ;

Hasegawa, Shigehiko ;

Eriguchi, Koji .

SURFACE & COATINGS TECHNOLOGY, 2019, 377

[29] Nanostructures of mixed-phase boron nitride via biased microwave plasma-assisted CVD [J].

Huang, Po-Chih ;

Wong, Ming-Show .

VACUUM, 2014, 100 :66-70

[30] The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD [J].

Seker, Z. ;

Ozdamar, H. ;

Esen, M. ;

Esen, R. ;

Kavak, H. .

APPLIED SURFACE SCIENCE, 2014, 314 :46-51

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