Electron-beam induced reactions of sulfonium salts in a crystalline state

被引：4

作者：

Enomoto, K

Maekawa, Y

Moon, SY

Shimoyama, J

Goto, K

Narita, T

Yoshida, M

机构：

[1] Japan Atom Energy Res Inst, Takasaki Radiat Chem Res Estab, Dept Mat Dev, Takasaki, Gumma 3701292, Japan

[2] Gunma Univ, Fac Engn, Dept Chem, Gunma 3768515, Japan

[3] Saitama Inst Technol, Fac Engn, Dept Appl Chem, Okabe, Saitama 3690293, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2004年 / 17卷 / 01期

关键词：

electron-beam resists; sulfonium salt; counter anion; crystalline state;

D O I：

10.2494/photopolymer.17.41

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：41 / 44

页数：4

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