Analytical model of secondary electron yield from metal surface with regular structures

被引:11
作者
Zhang Na [1 ,2 ]
Cao Meng [1 ]
Cui Wan-Zhao [2 ]
Hu Tian-Cun [2 ]
Wang Rui [2 ]
Li Yun [2 ]
机构
[1] Xi An Jiao Tong Univ, Sch Elect & Informat Engn, Minist Educ, Key Lab Phys Elect & Devices, Xian 710049, Peoples R China
[2] China Acad Space Technol Xian, Natl Key Lab Sci & Technol Space Microwave, Xian 710100, Peoples R China
基金
中国国家自然科学基金;
关键词
secondary electron emission; secondary electron yield; analytical model; regular surfaces; EMISSION; MULTIPACTOR; DISCHARGE;
D O I
10.7498/aps.64.207901
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
An analytical model of secondary electron (SE) emission (SEE) from metal surface with regular structure is presented. In this model, the quantitative relationship between the SE emission yield (SEY) and surface topography is examined. Using the idea of multi-generation for SE emission, the first-generation of SEs is considered as being dominant in total SEs. The shielding effect of the surface structures on the SE is found to be the main factor influencing final SEY. On the basis of the cosine distribution of secondary electrons emission direction, the quantitative relationship between the SEY and surface topography parameters is revealed. Then taking the rectangular and triangular grooves for example, the analytical formulas of first-generation SEY are derived for both normal and oblique incidence. The analytical results are then verified with the Monte Carlo simulation results and experimental data. The results show that a rectangular groove with a bigger depth-to-width ratio can suppress the SEE more efficiently. For a triangular groove, owing to having both enhancing and suppressing effects on SEE, a small groove angle is required for effective SEE suppression. The present analytical model gives an insight into the relationship between the SEY and the surface topography parameters and is helpful for the structure design to modify SEY.
引用
收藏
页数:9
相关论文
共 21 条
[1]   Secondary electron emission from rough metal surfaces: a multi-generation model [J].
Cao, Meng ;
Zhang, Na ;
Hu, Tian-Cun ;
Wang, Fang ;
Cui, Wan-Zhao .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2015, 48 (05)
[2]   Field distribution, HPM multipactor, and plasma discharge on the periodic triangular surface [J].
Chang, C. ;
Liu, G. Z. ;
Fang, J. Y. ;
Tang, C. X. ;
Huang, H. J. ;
Chen, C. H. ;
Zhang, Q. Y. ;
Liang, T. Z. ;
Zhu, X. X. ;
Li, J. W. .
LASER AND PARTICLE BEAMS, 2010, 28 (01) :185-193
[3]   The effect of grooved surface on dielectric multipactor [J].
Chang, C. ;
Huang, H. J. ;
Liu, G. Z. ;
Chen, C. H. ;
Hou, Q. ;
Fang, J. Y. ;
Zhu, X. X. ;
Zhang, Y. P. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (12)
[4]   The effects of magnetic field on single-surface resonant multipactor [J].
Chang, Chao ;
Verboncoeur, John ;
Tantawi, Sami ;
Jing, Chunguang .
JOURNAL OF APPLIED PHYSICS, 2011, 110 (06)
[5]   Characteristics of wall sheath and secondary electron emission under different electron temperatures in a Hall thruster [J].
Duan Ping ;
Qin Hai-Juan ;
Zhou Xin-Wei ;
Cao An-Ning ;
Chen Long ;
Gao Hong .
CHINESE PHYSICS B, 2014, 23 (07)
[6]   Probabilistic model for the simulation of secondary electron emission [J].
Furman, MA ;
Pivi, MTF .
PHYSICAL REVIEW SPECIAL TOPICS-ACCELERATORS AND BEAMS, 2002, 5 (12) :82-99
[7]  
Kawata J., 1995, J NUCL MATER, V222, P997
[8]   Multipactor discharge on metals and dielectrics: Historical review and recent theories [J].
Kishek, RA ;
Lau, YY ;
Ang, LK ;
Valfells, A ;
Gilgenbach, RM .
PHYSICS OF PLASMAS, 1998, 5 (05) :2120-2126
[9]   A combined phenomenological model for secondary electron emission [J].
Li Yong-Dong ;
Yang Wen-Jin ;
Zhang Na ;
Cui Wan-Zhao ;
Liu Chun-Liang .
ACTA PHYSICA SINICA, 2013, 62 (07)
[10]   ELECTRON MEAN-FREE-PATH CALCULATIONS USING A MODEL DIELECTRIC FUNCTION [J].
PENN, DR .
PHYSICAL REVIEW B, 1987, 35 (02) :482-486