InMnN: a nitride-based diluted magnetic semiconductor

被引:13
作者
Chen, PP [1 ]
Makino, H [1 ]
Yao, T [1 ]
机构
[1] Tohoku Univ, Inst Mat Res, Aboba Ku, Sendai, Miyagi 9808577, Japan
关键词
magnetic materials; nitrides; molecular beam epitaxy;
D O I
10.1016/j.ssc.2004.01.023
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
New nitride-based diluted magnetic semiconductor In1-xMnxN films were grown on Al2O3 Substrate at low temperature (200degreesC) by RF-plasma-assisted molecular beam epitaxy. Both X-ray diffraction and atomic force microscope indicate that Mn can be homogeneously incorporated into InN up to 10%. The bandgap of In1-xMnxN decreases with increasing Mn concentration. Magnetization measurements indicate that the ln(1-x)Mn(x)N films with low Mn content x = 0.04 displayed a clear paramagnetic behavior down to 1.7 K, whereas a paramagnetic to spin-glass transition was observed for the samples with x = 0.1 at about 3 K. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:25 / 29
页数:5
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