Nanoindentation-Induced Phase Transformation in Silicon Thin Films

被引：4

作者：

Ctvrtlik, Radim ^{[1
]}

Tomastik, Jan ^{[1
]}

Ranc, Vaclav ^{[2
]}

机构：

[1] Palacky Univ, Reg Ctr Adv Technol & Mat, Joint Lab Opt, 17 Listopadu 12, Olomouc 77146, Czech Republic

[2] Palacky Univ, Fac Sci, Reg Ctr Adv Technol & Mat, Dept Phys Chem, Olomouc 77146, Czech Republic

来源：

LOCAL MECHANICAL PROPERTIES IX | 2014年 / 586卷

关键词：

Nanoindentation; silicon; thin films; phase transformation;

D O I：

10.4028/www.scientific.net/KEM.586.112

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanoindentation-induced phase transformation of amorphous, annealed amorphous and microcrystalline hydrogen-free silicon thin films were studied. Series of nanoindentation experiments were performed with a sharp Berkovich indenter at various unloading rates. The structural changes in indentation deformed regions were examined using Raman spectroscopy. Analyses of indentation curves and Raman spectra suggest that high pressure phases appear more easily in annealed amorphous Si thin films than in microcrystalline ones.

引用

页码：112 / +

页数：2