Study of Xe Adsorption on Single Wall Silicon Nanotubes Using Molecular Dynamics Simulation

被引:2
作者
Jalili, S. [1 ,2 ]
Ashrafi, R. [2 ]
机构
[1] K N Toosi Univ Technol, Dept Chem, Tehran, Iran
[2] Inst Studies Theoret Phys & Math IPM, Computat Phys Sci Res Lab, Dept Nanosci, Tehran, Iran
关键词
Single Wall Silicon Nanotube; Molecular Dynamics Simulation; Adsorption Isotherm; Isosteric Heat; Binding Energy;
D O I
10.1166/jctn.2009.1102
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Adsorption of Xenon on the internal and external surfaces of single wall silicon nanotubes (SWS-iNTs) were studied using molecular dynamics simulation. The adsorption of Xe on the (6,6), (8,8) and (10,10) SWSiNTs is studied at 100 to 150 K and different pressures. Adsorption isotherms, isosteric heat of adsorption and binding energy for the adsorption of Xe atoms on the Si nanotubes are obtained. We found that a large amount of Xe adsorb on Si nanotube. The storage capacity and arrangement of Xe atoms inside of these nanotubes depend to the nanotube's diameter.
引用
收藏
页码:737 / 741
页数:5
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