Properties of electrical conductivity of amorphous tungsten-doped vanadium oxide for uncooled microbolometers

被引:6
作者
Han, Yong Hee [1 ]
Lee, Seung Hoon [1 ]
Kim, Kun Tae [1 ]
Choi, In Hoon [2 ]
Moon, Sung [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Microsyst Res Ctr, 39-1 Hwawolgok Dong, Seoul 136791, South Korea
[2] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
来源
ADVANCES IN NANOMATERIALS AND PROCESSING, PTS 1 AND 2 | 2007年 / 124-126卷
关键词
microbolometers; vanadium oxide; conductivity;
D O I
10.4028/www.scientific.net/SSP.124-126.343
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In recent years, we have reported uncooled microbolometer with amorphous vanadium-tungsten oxide as a thermometric material. The reported tungsten-doped vanadium oxide showed very high TCR over -3.0%/K compared with common vanadium oxide, which generally has the TCR values near -2.0%/K. In this work, we characterized properties of electrical conductivity of amorphous tungsten-doped vanadium oxide by investigating electronic structure between vanadium oxide and tungsten-doped vanadium oxide. Finally, it is concluded that tungsten addition into vanadium give rise to changes of electronic structure when pure vanadium is oxidized and this changes of electronic structure attribute to electrical properties such as high TCR values of vanadium-tungsten oxide.
引用
收藏
页码:343 / +
页数:2
相关论文
共 7 条
  • [1] Raman and XPS characterization of vanadium oxide thin films deposited by reactive RF sputtering
    Cazzanelli, E
    Mariotto, G
    Passerini, S
    Smyrl, WH
    Gorenstein, A
    [J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1999, 56 (3-4) : 249 - 258
  • [2] Structure characterization of vanadium oxide thin films prepared by magnetron sputtering methods
    Cui, JZ
    Da, DA
    Jiang, WS
    [J]. APPLIED SURFACE SCIENCE, 1998, 133 (03) : 225 - 229
  • [3] Enhanced characteristics of an uncooled microbolometer using vanadium-tungsten oxide as a thermometric material
    Han, YH
    Kim, KT
    Shin, HJ
    Moon, S
    Choi, IH
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (25) : 1 - 3
  • [4] A semiconductor YBaCuO microbolometer for room temperature IR imaging
    Jahanzeb, A
    Travers, CM
    CelikButler, Z
    Butler, DP
    Tan, SG
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (10) : 1795 - 1801
  • [5] Micromachined, uncooled, VO2-based, IR bolometer-arrays
    Jerominek, H
    Picard, F
    Swart, NR
    Renaud, M
    Levesque, M
    Lehoux, M
    Castonguay, JS
    Pelletier, M
    Bilodeau, G
    Audet, D
    Pope, TD
    Lambert, P
    [J]. INFRARED DETECTORS AND FOCAL PLANE ARRAYS IV, 1996, 2746 : 60 - 71
  • [6] CONDUCTION BANDS IN A NONCRYSTALLINE ENVIRONMENT
    MOTT, NF
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 90 (1-3) : 1 - 8
  • [7] Infrared focal plane array incorporating silicon IC process compatible bolometer
    Tanaka, A
    Matsumoto, S
    Tsukamoto, N
    Itoh, S
    Chiba, K
    Endoh, T
    Nakazato, A
    Okuyama, K
    Kumazawa, Y
    Hijikawa, M
    Gotoh, H
    Tanaka, T
    Teranishi, N
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (11) : 1844 - 1850