Optical and electrical studies of arsenic-implanted HgCdTe films grown c with molecular beam epitaxy on GaAs and Si substrates

被引:20
作者
Izhnin, I. I. [1 ,2 ]
Voitsekhovsky, A. V. [2 ]
Korotaev, A. G. [2 ]
Fitsych, O. I. [3 ]
Bonchyk, A. Yu. [4 ]
Savytskyy, H. V. [4 ]
Mynbaev, K. D. [5 ,6 ]
Varavin, V. S. [7 ]
Dvoretsky, S. A. [2 ,7 ]
Mikhailov, N. N. [7 ]
Yakushev, M. V. [7 ]
Jakiela, R. [8 ]
机构
[1] R&D Inst Mat SRC Carat, UA-79031 Lvov, Ukraine
[2] Natl Res Tomsk State Univ, Tomsk 634050, Russia
[3] P Sahaydachnyi Army Acad, UA-79012 Lvov, Ukraine
[4] NAS Ukraine, Ya S Pidstryhach Inst Appl Problems Mech & Math, UA-79060 Lvov, Ukraine
[5] Ioffe Inst, St Petersburg 194021, Russia
[6] ITMO Univ, St Petersburg 197101, Russia
[7] Russian Acad Sci, Rzhanov Inst Semicond Phys, Siberian Branch, Novosibirsk 630090, Russia
[8] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
关键词
HgCdTe; p-n junctions; Ion implantation; Defects; DAMAGE; DEPTH;
D O I
10.1016/j.infrared.2016.12.006
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A defect study was performed on arsenic-implanted Hg1-xCdxTe (x = 0.23-0.30) films with graded-gap surface layers, grown with molecular-beam epitaxy on GaAs and Si substrates and designed for fabrication of 'p(+)-n'-type photodiodes. First, formation of n(+)-p structure was investigated in p-type material, in order to study radiation-induced donor defects. Next, formation of p(+)-n structure was investigated in the course of implantation in n-type material and arsenic activation annealing. Influence of the graded-gap surface layer was found to be expressed in the degree of saturation of the concentration of radiation induced defects, With results obtained on arsenic-and boron-implanted material differing due to the difference in the ion masses. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:52 / 58
页数:7
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