High temperature stability of indium tin oxide thin films

被引:91
作者
Gregory, OJ [1 ]
Luo, Q [1 ]
Crisman, EE [1 ]
机构
[1] Univ Rhode Isl, Sensors & Surface Technol Partnership, Dept Chem Engn, Kingston, RI 02881 USA
基金
美国国家航空航天局;
关键词
indium-tin-oxide (ITO); electron spectroscopy for chemical analysis (ESCA); strain gage; RF sputtering;
D O I
10.1016/S0040-6090(01)01773-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A robust high temperature strain gage based on indium-tin-oxide (ITO) has been used to measure static and dynamic strains at temperatures up to 1400 degreesC. These thin film, ceramic strain gages have several advantages over metal strain gages including a large gage factor and increased chemical and electrical stability at very high temperatures. Electron spectroscopy for chemical analysis (ESCA) of ITO films deposited onto high purity alumina substrates and subjected to temperatures up to 1400 degreesC indicated that the ITO films had undergone an interfacial reaction with the substrate. In addition, the interfacial reaction appears to have been responsible for high temperature stabilization through the formation of an ITO/Al2O3 solid solution. When similar ITO films were deposited onto alumina with a platinum diffusion barrier, there was no evidence of an interfacial reaction. Thermodynamic calculations indicated that bulk ITO may not be stable in air ambients at temperatures above 1300 degreesC but the alumina substrates stabilized the ITO to temperatures well beyond this value. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:286 / 293
页数:8
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