Wafer-Scale Precise Patterning of Organic Single-Crystal Nanowire Arrays via a Photolithography-Assisted Spin-Coating Method

被引：88
作者：
Deng, Wei [1 ,2 ]
Zhang, Xiujuan [1 ,2 ]
Wang, Liang [1 ,2 ]
Wang, Jincheng [1 ,2 ]
Shang, Qixun [1 ,2 ]
Zhang, Xiaohong [1 ,2 ]
Huang, Liming [1 ,2 ]
Jie, Jiansheng [1 ,2 ]
机构：
[1] Soochow Univ, Inst Funct Nano & Soft Mat FUNSOM, Suzhou 215123, Jiangsu, Peoples R China
[2] Soochow Univ, Jiangsu Key Lab Carbon Based Funct Mat & Devices, Collaborat Innovat Ctr Suzhou Nano Sci & Technol, Suzhou 215123, Jiangsu, Peoples R China
来源：
ADVANCED MATERIALS | 2015年 / 27卷 / 45期
基金：
中国国家自然科学基金;
关键词：
SEMICONDUCTOR; EVAPORATION; ALIGNMENT; GROWTH;
D O I：
10.1002/adma.201503019
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A photolithography-assisted spin-coating approach is developed to produce single-crystal organic nanowire (NW) arrays at designated locations with high precision and high efficiency. This strategy enables the large-scale fabrication of organic NW arrays with nearly the same accuracy, reliability, and flexibility as photolithography. The high mobilities of the organic NWs enable the control of the switch of multi-colored light-emitting devices with good stability.
引用
收藏
页码：7305 / +
页数：9
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