The electrodeposition of metal at metal/carbon nanotube junctions

被引:18
作者
Austin, DW
Puretzky, AA
Geohegan, DB
Britt, PF
Guillorn, MA
Simpson, ML [1 ]
机构
[1] Univ Tennessee, Dept Elect & Comp Engn, Knoxville, TN 37996 USA
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
[3] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
[4] Oak Ridge Natl Lab, Div Chem Sci, Oak Ridge, TN 37831 USA
[5] Oak Ridge Natl Lab, Mol Scale Engn & Nanoscale Technol Grp, Oak Ridge, TN 37831 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0009-2614(02)00992-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We deposited a semiconducting single-walled carbon nanotube on Pd electrodes, and the initial charge transport measurements showed the usual large contact resistance between the electrodes and the nanotube. We electroplated Au over the electrodes with no obvious deposition of An along the sidewalls of the nanotube between the electrodes. Post deposition charge transport measurements indicated more than a factor of six decrease in the electrode/nanotube contact resistance, yet the semiconducting behavior of the nanotube was maintained. A significant difference in the post deposition I-V characteristics may be explained by an electronic or mechanical modification of the nanotube/electrode junction. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:525 / 529
页数:5
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