Diffusion study of nitrogen implanted into α-Hf using the nuclear resonance technique

被引：4

作者：

Bregolin, F. L. ^{[1
]}

Behar, M. ^{[1
]}

Dyment, F. ^{[2
]}

机构：

[1] Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil

[2] Consejo Nacl Invest Cient & Tecn, RA-1033 Buenos Aires, DF, Argentina

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2009年 / 95卷 / 02期

关键词：

SELF-DIFFUSION; SINGLE-CRYSTAL; ZR; TI; ZIRCONIUM; HAFNIUM; BULK; AL;

D O I：

10.1007/s00339-008-4927-y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The diffusion of nitrogen in alpha-Hf was studied in the temperature range of (823-1123) K using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow the Arrhenius behavior D(T)=D (0)exp (-Q/RT) with D (0)=(5.5 +/- 2.1)x10(-7) m(2)/s and Q=(228 +/- 1) kJ/mol. A comparison of the present results with the previous one is done.

引用

页码：501 / 505

页数：5

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