Diffusion study of nitrogen implanted into α-Hf using the nuclear resonance technique

被引：4
|
作者：
Bregolin, F. L. [1 ]
Behar, M. [1 ]
Dyment, F. [2 ]
机构：
[1] Univ Fed Rio Grande do Sul, Inst Fis, BR-91501970 Porto Alegre, RS, Brazil
[2] Consejo Nacl Invest Cient & Tecn, RA-1033 Buenos Aires, DF, Argentina
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2009年 / 95卷 / 02期
关键词：
SELF-DIFFUSION; SINGLE-CRYSTAL; ZR; TI; ZIRCONIUM; HAFNIUM; BULK; AL;
D O I：
10.1007/s00339-008-4927-y
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The diffusion of nitrogen in alpha-Hf was studied in the temperature range of (823-1123) K using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow the Arrhenius behavior D(T)=D (0)exp (-Q/RT) with D (0)=(5.5 +/- 2.1)x10(-7) m(2)/s and Q=(228 +/- 1) kJ/mol. A comparison of the present results with the previous one is done.
引用
收藏
页码：501 / 505
页数：5
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